GREAT LAKES CRYSTAL TECHNOLOGIES INC — Department of Defense SBIR Phase I: N201-074

Description

In Phase I Great Lakes Crystal Technologies and Michigan State University will develop a concept for a diamond-based semiconductor pulse sharpener (SPS) that meets the criteria set out in the topic description. The team will begin by designing, fabricating, and testing a diamond-based drift step recovery diode (DSRD) to demonstrate its performance and to confirm its performance is consistent with DSRD operation. Next a diamond-based semiconductor avalanche shaper (SAS) will be designed and fabricated, and tested to demonstrate its performance and confirm it is consistent with SAS operation. Then the performance of the SAS and DSRD will be used to inform a concept for the realization of a diamond-based SPS for sub-nanosecond rise time sharpening of a 3-5 ns driving pulses to achieve 300 ps pulses. SPS design criteria will emphasize compactness and all the other criteria set forth in the topic description. In Phase II diamond based single wafer and stacked wafer sub-nanosecond semiconductor pulse sharpeners will be fabricated and tested for their ability to reach the target performance specification called out in the topic description.