NEXGENSEMI CORPORATION — Department of Defense SBIR Phase I: NexGenSemi Corporation develops advanced semiconductor manufacturing technology for tomorr
NEXGENSEMI CORPORATION — SBIR Phase I award from Department of Defense.
- Amount
- $99,913
- Agency
- Department of Defense · Missile Defense Agency
- Program / Phase
- SBIR · Phase I
- Solicitation
- 2012.3
- NAICS
- —
- Place of performance
- CA
- Period
- 2013-03-14 → 2013-09-17
Description
NexGenSemi Corporation develops advanced semiconductor manufacturing technology for tomorrow"s leveraged electronics. The company is proposing the development of a novel layer-by-layer patterned growth from direct digital design for semiconductor electronics manufacturing. The material growth technology is a modified heterogeneous patterned nucleation deposition process which is key to manufacturing electronics in a single prototyping system. The novelty is a 10,000x manufacturing improvement rate leading to quick turn prototype and pilot production semiconductor manufacturing. The program has defined objectives and goals outlined to meet commercialization standards to successfully integrate the technology into industry