SI2 TECHNOLOGIES, INC — Department of Defense STTR Phase I: SI2 Technologies proposes to create a revolutionary manufacturing approach to print sub-wa

Description

SI2 Technologies proposes to create a revolutionary manufacturing approach to print sub-wavelength patterned coatings on flexible roll-to-roll substrates for use in photonic devices. SI2 will utilize a wide format, roll to roll inkjet printing process to precisely deposit precision patterned low cost, high throughput metals, dielectrics, and electro-optic polymer materials. The coatings can be deposited on multiple types of substrates for both planar and vertically stacked photonic designs enabling tailored devices such as electro-optic modulators for Active Electrically Scanned Array (AESA) radar and communication systems. Implementing a non-contact additive roll-to-roll sub-wavelength fabrication method offers promising alternatives to current lithography-free nano-stamping fabrication methods. An integrated and complementary approach to manufacturing in-situ high throughput photonic devices eliminates tool wear, as well as proximity and protrusion defects.