Surfx Technologies LLC — Department of Defense SBIR Phase I: A18-033

Description

Atmospheric pressure, plasma-enhanced chemical vapor deposition (PECVD) is an emerging technology that shows promise to advance the state-of-the-art in multifunctional coatings. An atmospheric pressure plasma device is proposed with the ability to create patterned, multifunctional coatings, and that incorporate nanoparticles into the layers. Chemical precursors will be added to the plasma to produce novel coatings. By controlling the plasma discharge chemistry and the ratio of the precursor to reactive gas flows, the composition of the coating can be tailored to achieve any desired functionality. The plasma deposition technology that is proposed will also incorporate nanoparticle additives into the matrix to enhance coating performance. The prototype tool will be used to deposit silica coatings at least 1.0 micron thick onto glass slides, acrylic coupons and polyester fabric that are 1" by 1" square. The optical properties of the silica coatings will be altered through the incorporation of gold nanoparticles into the soft silica layers.