MICROSOL TECHNOLOGIES INC. — Department of Defense SBIR Phase I: A16-039
MICROSOL TECHNOLOGIES INC. — SBIR Phase I award from Department of Defense.
- Amount
- $99,996
- Agency
- Department of Defense · Army
- Program / Phase
- SBIR · Phase I
- Topic
- A16-039
- Solicitation
- 2016.1
- NAICS
- —
- Place of performance
- TX
- Period
- 2016-09-12 → 2017-03-11
Description
In this Small Business Innovation Research Phase I effort, MicroSol Technologies Inc. and University of Texas at Dallas (UTD) will collaborate to develop a high-k material for application in IR image sensor readout integrated circuits. High-k Al2O3/TiOx nanolaminates will be in-situ deposited by atomic layer deposition (ALD).Material properties will be optimized to achieve a high dielectric constant and low leakage current. 3-D structured metal insulator metal (MIM) capacitors compatible with 180nm and 250nm CMOS foundry process flows will be designed, fabricated, and characterized to demonstrate charge capacitive density greater than 80fF/um2. Material will be characterized and optimized for thickness uniformity, charge density, leakage current, breakdown voltage, and long-term reliability.