OSTENDO TECHNOLOGIES, INC. — Department of Defense SBIR Phase I: A14-035

OSTENDO TECHNOLOGIES, INC. — SBIR Phase I award from Department of Defense.

Amount
$99,978
Agency
Department of Defense · Army
Program / Phase
SBIR · Phase I
Topic
A14-035
Solicitation
2014.1
NAICS
Place of performance
CA
Period
2014-09-22 → 2015-03-22

Description

Ostendo Technologies, with partners HexaTech, Inc. and the Ohio State University, propose a comprehensive mid-UV laser diode device design, simulation, and materials development program to yield CW 280 nm lasers. Ostendo will utilize its state-of-the-art Optoelectronics Device Modeling Software to simulate and refine the performance of laser diode designs in an iterative fashion to reduce development time and cost. Current state-of-the-art UV laser structures will be enhanced with tunnel junctions to improve hole injection and reduce contact resistance. Ostendo will further begin to establish the materials foundation for the device fabrication to occur in Phase II by 1) establishing the necessary AlN substrate pre-treatment chemistry to fully realize the structural benefits of free-standing AlN substrates, and 2) develop HVPE-based p-type AlGaN for hole injection. This aggressive yet feasible project will yield a pathway for 280 nm laser fabrication in Phase II.