INTELLIGENT EPITAXY TECHNOLOGY, INC. — Department of Defense SBIR Phase I: This Phase I SBIR effort will seek to develop high performance superlattice infrared focal
INTELLIGENT EPITAXY TECHNOLOGY, INC. — SBIR Phase I award from Department of Defense.
- Amount
- $100,000
- Agency
- Department of Defense · Missile Defense Agency
- Program / Phase
- SBIR · Phase I
- Solicitation
- 2010.3
- NAICS
- —
- Place of performance
- TX
- Period
- 2011-08-01
Description
This Phase I SBIR effort will seek to develop high performance superlattice infrared focal plane array technology by establishing a 4"GaSb substrate manufacturing line based in Texas. Under this program, IntelliEPI proposes to develop 4"GaSb crystal pulling capability based on the vertical gradient freeze method. In addition, a double-side polishing capacity for GaSb up to 4"in diameter will be established. This will provide a supply of high-quality, large diameter substrates to support epitaxial growth development.