PHOTRONIX — Department of Defense SBIR Phase I: Under a recently completed Air Force SBIR Phase II program, we demonstrated the initial fe

PHOTRONIX — SBIR Phase I award from Department of Defense.

Amount
$99,961
Agency
Department of Defense · Missile Defense Agency
Program / Phase
SBIR · Phase I
Solicitation
2010.3
NAICS
Place of performance
MA
Period
2011-07-05

Description

Under a recently completed Air Force SBIR Phase II program, we demonstrated the initial feasibility of a back-illuminated p-on-n LWIR HgCdTe junction photodiode formed by diffusion of arsenic from a vapor source. This initial successful demonstration used a mesa format. Our proposed Phase I program will continue the development of the basic arsenic-vapor-diffused lateral-collection micro-junction process, extending the process to a planar architecture and to small-area junctions and demonstrate the overall feasibility of this new architecture, with the goal of achieving higher operability than the traditional two-layer mesa Very Long Wave Infrared (VLWIR) HgCdTe p-on-n devices achieve. Our Phase II program will further extend this work to large-format VLWIR FPAs and demonstrate improved operability in 512x512 arrays with 20x20 m unit cells. The combination of our novel methods and creative processing techniques is the key to the success for this new technology.