LUMARRAY, INC. — Department of Defense SBIR Phase I: DTRA143-008
LUMARRAY, INC. — SBIR Phase I award from Department of Defense.
- Amount
- $149,838
- Agency
- Department of Defense · Defense Threat Reduction Agency
- Program / Phase
- SBIR · Phase I
- Topic
- DTRA143-008
- Solicitation
- 2014.3
- NAICS
- —
- Place of performance
- MA
- Period
- 2015-12-08 → 2016-07-13
Description
LumArray proposes in Phase I to demonstrate that its direct-write maskless-photolithography system, the ZP-150, is capable of performing aligned cuts in 1D-grids suitable for the 45 nm node, in addition to writing patterns of arbitrary geometry as required in custom ASICs and a wide range of other DoD and Aerospace applications. In Phase II LumArray will propose to make upgrades to its ZP-150 system that will enable it to meet the needs of 1D gridded lithography at nodes below 45 nm.