NHANCED SEMICONDUCTORS, INC. — Department of Defense SBIR Phase I: AF141-250
NHANCED SEMICONDUCTORS, INC. — SBIR Phase I award from Department of Defense.
- Amount
- $149,257
- Agency
- Department of Defense · Air Force
- Program / Phase
- SBIR · Phase I
- Topic
- AF141-250
- Solicitation
- 2014.2
- NAICS
- —
- Place of performance
- IL
- Period
- 2014-06-30 → 2015-03-30
Description
ABSTRACT: ReRAM has made significant progress over the last few years and is ready for development by early adopters. Tezzaron proposes to create a multilayer 3D assembled ReRAM memory device using Rambus ReRAM technology and Honeywell RH wafers. The phase II target device will be radiation hardened, low power, non-volatile and have a density in excess of 512Mbits. BENEFIT: A ReRAM device offers great advantages over other current non-volatile radiation hardened devices. The ReRAM has fast read and write with low power. The low write currents scale with technology making the ReRAM a viable choice for current and future semiconductor technology nodes. The ReRAM memory cell is virtually unaffected by radiation making it a good choice for space applications. These same attributes also make the targeted device valuable for a large number of applications in aviation and automotive fields.