NEXGENSEMI CORPORATION — Department of Defense SBIR Phase I: NexGenSemi will develop a unique semiconductor fabrication process to execute multiple AT
NEXGENSEMI CORPORATION — SBIR Phase I award from Department of Defense.
- Amount
- $99,982
- Agency
- Department of Defense · Air Force
- Program / Phase
- SBIR · Phase I
- Solicitation
- 2010.3
- NAICS
- —
- Place of performance
- CA
- Period
- 2011-01-12
Description
NexGenSemi will develop a unique semiconductor fabrication process to execute multiple AT techniques on a single wafer. During the phase I program, NexGenSemi will perform preliminary sub 90nm tests leading to the TAPO ASIC test structures to be fully executed in the phase II. BENEFIT: Provide the DOD a high speed, low cost Trusted AT manufacturing method for electronics below the 90nm node.