OPTOMEC, INC. — Department of Defense STTR Phase II: ABSTRACT: The goal of this phase II proposal is to develop a commercial platform for prin

OPTOMEC, INC. — STTR Phase II award from Department of Defense.

Amount
$749,793
Agency
Department of Defense · Air Force
Program / Phase
STTR · Phase II
Solicitation
2009.B
NAICS
Place of performance
NM
Period
2013-01-22 → 2015-01-22

Description

ABSTRACT: The goal of this phase II proposal is to develop a commercial platform for printing high performance, single-walled carbon nanotube transistor circuits on large-area plastic substrate. Automated processes will be developed for the room temperature printing of metal, semiconductor, and dielectric materials with micron-scale alignment accuracy. The transistor performance will be enhanced by optimizing the material formulations as well as optimizing the print features. Specifically, printed channel widths below 10 microns and gate dielectric thickness below 100 nm are targeted. This will potentially allow frequency performance in the GHz range. Many commercial and defense applications have already identified such as roll-up maps, RF antenna, and distributed sensor networks. The Optomec commercialization plan will leverage off already successful product launches where initially the market was seeded with R & D tools. Sales of production tools followed after a period of qualification and validation. BENEFIT: Example applications include roll-up maps, active matrix displays, sensor networks, arithmetic logic units, and rf antenna. The proposed printing system will be capable of fabricating circuits at low-cost and on large-area substrates.